Waferpedia

Comparison ledger

0020 17485 PartversusGasonics Vector

Applied Materials 0020 17485 Part, Lam Research Gasonics Vector, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0020 17485 PartApplied Materials
Gasonics VectorLam Research
OEMApplied MaterialsLam Research
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 17485 PartLam Research Gasonics Vector
Specifications
ConfigurationStrap, RF Out 2 Balanced Coil Match, Hdp[1]SiN Oxide[2]
User Interface—screen & computer[4]
Equipment type—PECVD (Plasma-Enhanced Chemical Vapor Deposition)[2]
Make—Lam / Novellus / Gasonics[2]
Model—Vector[2]
Application/material—SiN Oxide[2]
Vintage—2003[2]
Additional configuration—2x FOUP Loadports; Mini-Environment (Front End); Atmospheric Robot; User Interface: screen & computer; Light Tower; 2x Loadlocks; 2x Loadlock Cooling Pedestals; 2x Linear Transfer Modules; 4x Showerheads; Al Heater Pedestals with lift pins (station 1); Al Heater Pedestals (stations 2-4); Pneumatic Spindle; Integrated Liquid Delivery System (not on this particular configuration); Low Frequency RF Generator; High Frequency RF Generator; RF Match; Endpoint Controller; Gas Box; Local Power Box; 3x Super Input / Output Controller; Motion Controller; Module Controller[4]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]inventory listing
  4. [4]inventory listing