Comparison ledger
Applied Materials 0010-22161 High EFF RF Match, Cascade Microtech Elite 300, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-22161 High EFF RF MatchApplied Materials | Elite 300Cascade Microtech |
|---|---|---|
| OEM | Applied Materials | Cascade Microtech |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-22161 High EFF RF Match | Cascade Microtech Elite 300 |
| Cited variants | — |
|
| Specifications | ||
| Make | Applied Materials[2] | — |
| Model | 0010-22161[2] | — |
| Description | HTESC PH 1 REV A[3] | — |
| Condition | Used[3] | — |
| Stock Number | BM6628[3] | — |
| Wafer size | — | 12 inch[4] |
| Chuck material | — | Nickel plated aluminum[5] |
| Chuck type | — | Femtoguard temperature chuck[4] |
| Software | — | Velox 3.2[5] |
| Microscope | — | eVue III pro Digital Microscope[5] |
| Objective | — | 10X Mitutoyo Plan Apo Objective[5] |
| Microchamber | — | Included[1] |
| Cooling unit | — | ATT C60-60 Cooling Unit[5] |
| Temperature control unit | — | ATT CMI Temp Control Unit[5] |
| Automation | — | Semi-automatic[1] |
| AttoGuard | — | Included[1] |
| PureLine | — | Included[1] |
| Performance | — | Precision Low Noise[4] |
| Platform type | — | probe station platform[1] |
| Operation | — | semi-automatic[1] |
| Technologies | — | MicroChamber, AttoGuard, and PureLine technologies[1] |
| Chuck | — | precision low-noise Femtoguard temperature chuck[4] |