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Comparison ledger

0010-22161 High EFF RF MatchversusCentura DPS 2 AE Minos

Applied Materials 0010-22161 High EFF RF Match, Applied Materials Centura DPS 2 AE Minos, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
Centura DPS 2 AE MinosApplied Materials
OEMApplied MaterialsApplied Materials
Category——
Wafer size——
Process node——
Introduced——
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Lifecycle——
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Control system——
Generation——
FamilyApplied Materials 0010-22161 High EFF RF MatchApplied Materials Centura DPS 2 AE Minos
Cited variants—
  • Centura DPS 2 AE Minos Poly[1]
  • Centura DPS 2 AE Minos Poly Gas Box[2]
Specifications
MakeApplied Materials[3]—
Model0010-22161[3]—
DescriptionHTESC PH 1 REV A[4]—
ConditionUsed[4]—
Stock NumberBM6628[4]—
Sources (4)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com
  2. [2]waferpedia.comwaferpedia.com
  3. [3]Equipment inventory listing
  4. [4]tarasemi.comtarasemi.com