Waferpedia

Comparison ledger

0010-16392 ESC AssemblyversusSEZ 323 Spin

Applied Materials 0010-16392 ESC Assembly, Lam Research SEZ 323 Spin, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-16392 ESC AssemblyApplied Materials
SEZ 323 SpinLam Research
OEMApplied MaterialsLam Research
CategoryEtchEtch
Wafer size—Single wafer
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-16392 ESC AssemblyLam Research SEZ
Cited variants—
  • Lam / SEZ 323 Spin Etcher[1]
  • 2002 Vintage[1]
  • 2005 Vintage[2]
  • 2006 Vintage[3]
Specifications
OEMApplied Materials[4]Lam / SEZ[6]
Model0010-16392[4]323[6]
TypeESC Assembly[4]—
Wafer Size300 mm[5]—
Electrode ConfigurationDual[5]—
Configuration—Chambers (2)[6]
Wafer Sizes—8, 12 inch[6]
Chambers—2[6]
Wafer sizes—8 inch, 12 inch[6]
Number of chambers—2[6]
Tool type—Spin Etcher[6]
Voltage—400 VAC[2]
Phase—3 Phase[2]
Max. Current—75 A[2]
Wafer size—Single wafer[2]

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Sources (6)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]Equipment inventory listing
  3. [3]Equipment inventory listing
  4. [4]Equipment inventory listing
  5. [5]spwindustrial.comspwindustrial.com
  6. [6]inventory listing