Comparison ledger
Applied Materials 0010-13622 RF Match for, SPTS MVD4500, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-13622 RF Match forApplied Materials | MVD4500SPTS |
|---|---|---|
| OEM | Applied Materials | SPTS |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-13622 RF Match for | SPTS MVD4500 |
| Specifications | ||
| Configuration | High Efficiency HE RF Match-Bias[1] | — |
| Model | 0010-13622[1] | — |
| Product Type | RF Match for PVD (Physical Vapor Deposition)[1] | — |
| Feature | High Efficiency HE RF Match-Bias[1] | — |
| Tool type | — | Panel and large substrate tool[2] |
| Maximum substrate size | — | Up to 930 x 720 mm[2] |
| Processing mode | — | Batch processing[2] |
| Standard substrates | — | Gen 4.5 substrates; glass, polymer sheets, metals[2] |
| Precursors | — | Up to 4 precursors[2] |
| Capabilities | — | Integrated plasma surface treatment and chamber clean capability[2] |
| Type of product | — | Deposition Tool[3] |
| Substrate size | — | up to 930 x 720 mm[2] |
| Substrate handling | — | multiple substrates[2] |
| Process capability | — | ALD and MVD[2] |
| Tool class | — | panel and large substrate tool[2] |
| Throughput mode | — | batch processing[2] |
| Standard substrate format | — | Gen 4.5 substrates[2] |
| Standard substrate materials | — | glass, polymer sheets, metals[2] |
| Integrated capabilities | — | integrated plasma surface treatment and chamber clean capability[2] |
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