Comparison ledger
Applied Materials 0010-13622 RF Match for, Pfeiffer ACP28G, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-13622 RF Match forApplied Materials | ACP28GPfeiffer |
|---|---|---|
| OEM | Applied Materials | Pfeiffer |
| Category | Deposition | Deposition |
| Wafer size | — | 100mm |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-13622 RF Match for | Pfeiffer ACP28G |
| Specifications | ||
| Configuration | High Efficiency HE RF Match-Bias[1] | — |
| Model | 0010-13622[1] | — |
| Product Type | RF Match for PVD (Physical Vapor Deposition)[1] | — |
| Feature | High Efficiency HE RF Match-Bias[1] | — |
| Pump type | — | Dry pump[2] |
| Role | — | Loadlock primary pump[2] |
| Manufacturer | — | Pfeiffer[2] |
| Contextual system | — | EVA 451 evaporator[2] |
| Intended application | — | Pumping traces of corrosive gas[3] |
| Pumping mechanism | — | Frictionless multi-stage roots design[3] |
| Voltage range | — | 90 to 254 VAC at 50 or 60 Hz[3] |
| Overhaul interval | — | 22,000 hours[3] |
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