Comparison ledger
Applied Materials 0010-13622 RF Match for, Oxford Instruments Plasmalab 133, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-13622 RF Match forApplied Materials | Plasmalab 133Oxford Instruments |
|---|---|---|
| OEM | Applied Materials | Oxford Instruments |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-13622 RF Match for | Oxford Instruments Plasmalab |
| Specifications | ||
| Configuration | High Efficiency HE RF Match-Bias[1] | — |
| Model | 0010-13622[1] | — |
| Product Type | RF Match for PVD (Physical Vapor Deposition)[1] | — |
| Feature | High Efficiency HE RF Match-Bias[1] | — |
| Frequency | — | 50 Hz[2] |
| Voltage | — | 415 Vac 3[3] |
| Process type | — | PECVD (Plasma-Enhanced Chemical Vapor Deposition)[2] |
| Category | — | Deposition[2] |
| Vintage | — | 2010[3] |
| Wafer size | — | 8"[4] |
| Maximum wafer size | — | 300 mm (330 mm chuck)[5] |
| RF power | — | 600 W, 13.56 MHz[5] |
| Electrode temperature control | — | 10 °C – 80 °C (water-cooled)[5] |
| Endpoint detection | — | Verity Optical Emission Spectroscopy (OES), 200–800 nm[5] |
| Gas delivery | — | 8-line manifold with 7 MFCs[5] |
| Power | — | 50 Hz[2] |
Plan your fab
Building a Deposition process? Get a complete equipment list.
Open the fab equipment planner →