Waferpedia

Comparison ledger

0010-13622 RF Match forversusIntegrity 14 Thermal

Applied Materials 0010-13622 RF Match for, Denton Vacuum Integrity 14 Thermal, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-13622 RF Match forApplied Materials
OEMApplied MaterialsDenton Vacuum
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-13622 RF Match forDenton Vacuum Integrity 14 Thermal
Specifications
ConfigurationHigh Efficiency HE RF Match-Bias[1]with Cryo pump[2]
Model0010-13622[1]—
Product TypeRF Match for PVD (Physical Vapor Deposition)[1]—
FeatureHigh Efficiency HE RF Match-Bias[1]—
Chamber Material—Stainless steel[3]
Chamber Internal Dimensions—Length: 13 inches, Diameter: 14.5 inches, Height: 18 inches[3]
Pump Type—CTI 8 cryopump[3]
Ultimate Vacuum—< 5e-7 mbar[3]
Evaporation Source—Dual-source thermal evaporator[3]
Deposition Monitor—Inficon crystal deposition rate monitor[3]
Substrate Holder—Single-dome rotating substrate holder with variable-speed control[3]
Optional Accessory—2kVA evaporation transformer[3]

Plan your fab

Building a Deposition process? Get a complete equipment list.

Open the fab equipment planner →
Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]his-tek.comhis-tek.com