Comparison ledger
Applied Materials 0010-13622 RF Match for, CHA 50 S E-Beam, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-13622 RF Match forApplied Materials | 50 S E-BeamCHA |
|---|---|---|
| OEM | Applied Materials | CHA |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-13622 RF Match for | CHA 50 S E-Beam |
| Specifications | ||
| Configuration | High Efficiency HE RF Match-Bias[1] | 5 pocket[2] |
| Model | 0010-13622[1] | — |
| Product Type | RF Match for PVD (Physical Vapor Deposition)[1] | — |
| Feature | High Efficiency HE RF Match-Bias[1] | — |
| Number of pockets | — | 5[2] |
| Beam controller | — | Temescal CV 8 scan / beam controller[2] |
| Deposition monitor | — | Maxtech MDC 360[2] |
| Vacuum pumps | — | CTI 8" cry pumps with helium recharge units[2] |
| Type | — | E-Beam Evaporator Deposition System[2] |
| Pocket Configuration | — | 5 pocket[2] |
| Deposition Monitor | — | Maxtech MDC 360 deposition monitor[2] |
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