Comparison ledger
Applied Materials 0010-13622 RF Match for, Applied Materials Endura 5500 HP, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-13622 RF Match forApplied Materials | Endura 5500 HPApplied Materials |
|---|---|---|
| OEM | Applied Materials | Applied Materials |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-13622 RF Match for | Applied Materials Endura 5500 |
| Specifications | ||
| Configuration | High Efficiency HE RF Match-Bias[1] | 3 wire + ground[2] |
| Model | 0010-13622[1] | Endura 5500 HP[2] |
| Product Type | RF Match for PVD (Physical Vapor Deposition)[1] | — |
| Feature | High Efficiency HE RF Match-Bias[1] | — |
| Voltage | — | 200 vac, 30[2] |
| Frequency | — | 60 Hz[2] |
| OEM | — | Applied Materials[2] |
| Equipment type | — | Sputtering system[2] |
| Category | — | Deposition[3] |
| Electrical power | — | 200 vac, 30 - 60 Hz[2] |
| Vintage | — | 1998[2] |
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