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Comparison ledger

0010-03485 Magnet AssyversusPiXDRO LP 30 Inkjet

Applied Materials 0010-03485 Magnet Assy, SUSS MicroTec PiXDRO LP 30 Inkjet, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
PiXDRO LP 30 InkjetSUSS MicroTec
OEMApplied MaterialsSUSS MicroTec
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssySUSS MicroTec PiXDRO
Specifications
ConfigurationWP AL 300mm PVD[1]System accuracy < 5 µm (3σ)[5]
OEMApplied Materials[1]—
Model0010-03485[1]—
DescriptionMAGNET ASSY, WP AL 300MM PVD[2]—
ProcessPVD[3]—
Wafer size300mm[4]—
VersionSpares[4]—
Part Number0010-03485[1]—
ManufacturerApplied Materials[1]—
Process TypePVD (Physical Vapor Deposition)[1]—
Application (Material)Aluminum (AL)[1]—
Wafer Diameter (associated)300 mm[1]—
Temperature—Table temperature up to 50 °C[5]
System accuracy—< 5 µm (3σ)[5]
Printable area—327 × 227 mm (A4)[5]
Max substrate thickness—25 mm[5]
Table temperature—up to 50 °C[5]
Max motion speed—250 mm/s[5]
Sources (5)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]layla-ec.comlayla-ec.com
  4. [4]fabsurplus.comfabsurplus.com
  5. [5]inventory listing