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Comparison ledger

0010-03485 Magnet AssyversusDiode Ion

Applied Materials 0010-03485 Magnet Assy, Perkin Elmer Diode Ion, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
Diode IonPerkin Elmer
OEMApplied MaterialsPerkin Elmer
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssyPerkin Elmer Diode Ion
Cited variants—
Specifications
ConfigurationWP AL 300mm PVD[4]—
OEMApplied Materials[4]—
Model0010-03485[4]203-2500[2]
DescriptionMAGNET ASSY, WP AL 300MM PVD[5]—
ProcessPVD[6]—
Wafer size300mm[7]—
VersionSpares[7]—
Part Number0010-03485[4]—
ManufacturerApplied Materials[4]—
Process TypePVD (Physical Vapor Deposition)[4]—
Application (Material)Aluminum (AL)[4]—
Wafer Diameter (associated)300 mm[4]—
Pumping Speed—25 L/S[2]
Flange Type—8.00" CFF[3]
Type—Differential/Noble Diode Ion Pump[3]
Pumping speed (203-2000)—20 L/s[1]
Pumping speed (203-2500)—25 L/s[2]
Sources (7)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com
  2. [2]surplus.ucsd.edusurplus.ucsd.edu
  3. [3]duniway.comduniway.com
  4. [4]inventory listing
  5. [5]semistarcorp.comsemistarcorp.com
  6. [6]layla-ec.comlayla-ec.com
  7. [7]fabsurplus.comfabsurplus.com