Comparison ledger
Applied Materials 0010-03485 Magnet Assy, Nikon NWL 851 Wafer, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | NWL 851 WaferNikon |
|---|---|---|
| OEM | Applied Materials | Nikon |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | Nikon NWL 851 Wafer |
| Specifications | ||
| Configuration | WP AL 300mm PVD[1] | — |
| OEM | Applied Materials[1] | — |
| Model | 0010-03485[1] | NWL 851[5] |
| Description | MAGNET ASSY, WP AL 300MM PVD[2] | — |
| Process | PVD[3] | — |
| Wafer size | 300mm[4] | — |
| Version | Spares[4] | — |
| Part Number | 0010-03485[1] | — |
| Manufacturer | Applied Materials[1] | — |
| Process Type | PVD (Physical Vapor Deposition)[1] | — |
| Application (Material) | Aluminum (AL)[1] | — |
| Wafer Diameter (associated) | 300 mm[1] | — |
| Objective lens | — | CF Plan 5 × BD NA0.135 / 10 × BD NA 0.30 / 50 × BD NA 0.80[5] |
| Eyepiece | — | CFIUW 10 /25 × 2 (magnification 10 ×, field of view 25 mm)[5] |
| Tube | — | 3 erect images, with C-mount adapter[5] |
| Observation method | — | reflected bright field/reflected dark field[5] |
| Revolver | — | ACP 21 with motorized switching controller (5 holes)[5] |
| Stage | — | Large 8-inch compatible stage, lower right handle (clutch-free mechanism), X-Y stroke 205 mm, 8-inch rotating holder[5] |
| Illumination device | — | LA 150 UX (halogen lamp 150 W[5] |
| Make | — | Nikon[5] |
| Type | — | Wafer Loader[5] |