Comparison ledger
Applied Materials 0010-03485 Magnet Assy, Lam Research SEZ SP 4300 Single Wafer Processing, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | SEZ SP 4300 Single Wafer ProcessingLam Research |
|---|---|---|
| OEM | Applied Materials | Lam Research |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | Lam Research SEZ SP 4300 Single Wafer Processing |
| Specifications | ||
| Configuration | WP AL 300mm PVD[1] | — |
| OEM | Applied Materials[1] | — |
| Model | 0010-03485[1] | — |
| Description | MAGNET ASSY, WP AL 300MM PVD[2] | — |
| Process | PVD[3] | — |
| Wafer size | 300mm[4] | — |
| Version | Spares[4] | — |
| Part Number | 0010-03485[1] | — |
| Manufacturer | Applied Materials[1] | — |
| Process Type | PVD (Physical Vapor Deposition)[1] | — |
| Application (Material) | Aluminum (AL)[1] | — |
| Wafer Diameter (associated) | 300 mm[1] | — |
| Product Type | — | Single wafer wet chemical processor / spin etcher[5] |
| Make | — | Lam / SEZ[6] |
| Manufacturer (stated) | — | SEZ[5] |
| Wafer Size | — | 300 mm (12 in)[5] |
| Number of Chambers | — | 4[5] |
| Number of Chemical Handling Cabinets (CHC) | — | 2 (internal)[5] |
| Number of Load Ports | — | 4 FOUP[5] |
| Year of Manufacture (this unit) | — | 2003[5] |