Comparison ledger
Applied Materials 0010-03485 Magnet Assy, Hitachi U 3900, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | U 3900Hitachi |
|---|---|---|
| OEM | Applied Materials | Hitachi |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | Hitachi U 3900 |
| Cited variants | — |
|
| Specifications | ||
| Configuration | WP AL 300mm PVD[2] | — |
| OEM | Applied Materials[2] | — |
| Model | 0010-03485[2] | — |
| Description | MAGNET ASSY, WP AL 300MM PVD[3] | — |
| Process | PVD[4] | — |
| Wafer size | 300mm[5] | — |
| Version | Spares[5] | — |
| Part Number | 0010-03485[2] | — |
| Manufacturer | Applied Materials[2] | — |
| Process Type | PVD (Physical Vapor Deposition)[2] | — |
| Application (Material) | Aluminum (AL)[2] | — |
| Wafer Diameter (associated) | 300 mm[2] | — |
| P/N | — | 2J2-0012[6] |
| Type | — | Double-beam, single-monochromator UV-visible spectrophotometer[1] |
| Wavelength range | — | 190 to 900 nm[1] |
| Band pass | — | Variable 0.1, 0.5, 1, 2, 4, and 5 nm[1] |
| Scan speed | — | 1.5, 3, 15, 30, 60, 120, 300, 600, 1200, 1800, 2400 nm/min[1] |
| Detector | — | Single photomultiplier[1] |
| Dimensions | — | 680 (W) x 692 (D) x 257 (H) mm; 27 in (W) x 27 in (D) x 10 in (H)[1] |
| Weight | — | Approx. 45 kg (100 lbs)[1] |
| Power requirements | — | 100, 120, 220, 230 or 240 V AC, 50/60 Hz, 300 VA[1] |
| Vintage | — | 2009[6] |