Comparison ledger
Applied Materials 0010-03485 Magnet Assy, Hitachi CG5000, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | CG5000Hitachi |
|---|---|---|
| OEM | Applied Materials | Hitachi |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | 2014 Date of manufacture |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | Hitachi CG5000 |
| Specifications | ||
| Configuration | WP AL 300mm PVD[1] | — |
| OEM | Applied Materials[1] | — |
| Model | 0010-03485[1] | — |
| Description | MAGNET ASSY, WP AL 300MM PVD[2] | — |
| Process | PVD[3] | Scanning Defect[5] |
| Wafer size | 300mm[4] | — |
| Version | Spares[4] | — |
| Part Number | 0010-03485[1] | — |
| Manufacturer | Applied Materials[1] | — |
| Process Type | PVD (Physical Vapor Deposition)[1] | — |
| Application (Material) | Aluminum (AL)[1] | — |
| Wafer Diameter (associated) | 300 mm[1] | — |
| Date of Manufacture | — | 2014-05-01[5] |
| Currently Configured for | — | 300mm[5] |
| Tool current condition | — | Power on, not on production[5] |
| Software Version | — | 58.52[5] |
| System Power Rating | — | 208 AC 1 Phase[5] |
| Loading Configuration | — | 3 L/Ps[5] |
| Technology | — | CD-SEM[6] |
| Application | — | Applications for wafers[6] |
| Measurement characteristics | — | measurement, high-resolution, high-throughput[6] |
| Configured wafer size | — | 300mm[5] |
| Year(s) | — | 2014[5] |
| Year of Manufacture | — | 2014-05-01[5] |
| Wafer Size | — | 300mm[5] |
| Electron Beam Voltage (Postdevelop L/S CD) | — | 500 eV[7] |
| Electron Beam Voltage (Postetch LCDU) | — | 800 eV[7] |
| Technology Node | — | sub-22nm[6] |
| Measurement Type | — | CD-SEM[5] |
| Measurement type | — | critical-dimension (CD) measurement[5] |
| Performance | — | high-resolution, high-throughput, high-repeatability[6] |
| Calibration | — | enhanced automatic calibration[6] |