Waferpedia

Comparison ledger

0010-03485 Magnet AssyversusE 2 M 2

Applied Materials 0010-03485 Magnet Assy, Edwards E 2 M 2, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
E 2 M 2Edwards
OEMApplied MaterialsEdwards
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssyEdwards E 2 M 2
Specifications
ConfigurationWP AL 300mm PVD[1]—
OEMApplied Materials[1]—
Model0010-03485[1]—
DescriptionMAGNET ASSY, WP AL 300MM PVD[2]—
ProcessPVD[3]—
Wafer size300mm[4]—
VersionSpares[4]—
Part Number0010-03485[1]—
ManufacturerApplied Materials[1]—
Process TypePVD (Physical Vapor Deposition)[1]—
Application (Material)Aluminum (AL)[1]—
Wafer Diameter (associated)300 mm[1]—
Maximum displacement (50 Hz)—2.8 m³/h[5]
Maximum displacement (60 Hz)—3.4 m³/h[5]
Pneurop displacement (50 Hz)—2.4 m³/h[5]
Pneurop displacement (60 Hz)—2.9 m³/h[5]
Ultimate vacuum (partial pressure, no gas-ballast)—2.5×10⁻⁴ mbar[5]
Ultimate vacuum (total pressure, no gas-ballast)—1×10⁻³ mbar[5]
Ultimate vacuum (partial pressure, full gas-ballast)—3×10⁻² mbar[5]
Maximum water vapour inlet pressure—15 mbar[5]
Maximum water vapour pumping rate—0.03 kg/h[5]
Maximum permitted outlet pressure (at full pump throughput)—0.5 bar gauge[5]
Motor rotational speed (50 Hz)—1450 rpm[5]
Motor rotational speed (60 Hz)—1750 rpm[5]
Recommended oil—Ultragrade 19[5]
Maximum oil capacity—0.55 litre[5]
Dimensions (A x B, single-phase motor variant)—449 mm x 131 mm[5]
Ambient temperature range (operation)—12 to 40 °C[5]
Ambient temperature range (storage)—-30 to 70 °C[5]
Sources (5)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]layla-ec.comlayla-ec.com
  4. [4]fabsurplus.comfabsurplus.com
  5. [5]idealvac.comidealvac.com