Comparison ledger
ABM -407B-2-S-CE-S293 Robot, KLA 5100, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 5100KLA | |
|---|---|---|
| OEM | ABM | KLA |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | ABM -407B-2-S-CE-S293 Robot | KLA 5100 |
| Cited variants | — |
|
| Specifications | ||
| Model | ABM-407B-2-S-CE-S293[2] | — |
| Description | ROBOT[2] | — |
| Refurbished RTP RTA | AG Associates 4100, 4108, 8108, 8800, 8800i,210, 310, 410, 610, 610I, MPT RTP-600S, 800S, RTP-3000[2] | — |
| KLA-Tencor Spare Parts and Service | RS-35C,RS-55,RS-75,RS-100,UV-1050,UV-1080,UV-1250,UV-1280,ASET F5 / F5X,AIT Systems,HRP-220 Stylus Profiler[2] | — |
| Refurbished Isotropic Plasma Etcher | Matrix, Tegal, Lam Research, Branson/IPC, PlasmaTherm[2] | — |
| Refurbished PECVD, ALD Equipment | Cambridge, Oxford PlasmaLab , Plasma-Therm, STS/SPTS, AMAT[2] | — |
| Refurbished Mask Aligner | Canon Neutronix PLA501/545, Suss MA200CC, MA8BA8 GEN3, MA8BA8 GEN2, MA8BA8, MA200E[2] | — |
| Refurbished Bonding | SUSS SB6E, SUSS SB8E, EVG 620 BA, EVG EV501, West Bond 7200AR 7400A[2] | — |
| Refurbished Wafer Prober | Electroglas EG 4090u+, EG 4090, EG 2001X, EG 1034X, Cascade PS-21[2] | — |
| Step measurement range | — | 100 Å to 300 µm[3] |
| Sample table | — | 200 mm with vacuum[3] |
| Maximum sample thickness | — | 20 mm[3] |
| Minimum sample length | — | 25 mm[3] |
| Wafer handling | — | Dual SMIF Cassette loader, 200mm[3] |
| Optics | — | 12k and 750 micron FOV optical microscopes with light source[3] |
| Microscope | — | 50 micron FOV with optical measurement, interferometer measurement, and autofocus[3] |
| Software | — | Windows NT / VAX[3] |
| Operating system | — | VMS[3] |
| Backup | — | SCSI back up unit[3] |
| Printer | — | Thermal mini printer[3] |
| Tool type | — | metrology and inspection tool[3] |
| Measurement application | — | overlay measurement on wafers[3] |
| Wafer size | — | 8-inch wafers[3] |
| Optical system | — | optical microscopes for measurement functions[3] |
| Microscope set | — | 12k microscope and a 750 micron field-of-view microscope with a light source[3] |
| Microscope functions | — | 50 micron field-of-view microscope performs optical measurement, interferometer measurement, and autofocus[3] |
| Measurement range | — | 100 Å to 300 µm[3] |
| Control software | — | Windows NT / VAX software[3] |
| Backup unit | — | SCSI Back up unit[3] |